APPLICATION AREA
yunmao
Advanced Optics
Yunmao's independently developed batch ALD and PEALD systems are designed for cutting-edge applications including Mini/Micro LED, advanced optics, and AR/VR. These systems achieve nanoscale thin-film deposition control while maintaining high-volume production capabilities, providing key technological support to overcome industry bottlenecks in both throughput and product performance. Taking the flagship batch plasma ALD system as an example, its proprietary multi-chamber synchronous deposition technology enables uniform film deposition with <1% thickness variation on complex substrates.
Related products
PBATCH Batch PEALD
PBATCH realises low temperature, high quality plasma-enhanced ALD processes for high-quality thin film deposition (e.g., SiO?, Al?O?, TiO?) on various substrates, including glass, organic materials, polymers, metals, and ceramics. This system delivers exceptional coating uniformity, repeatability, and reliability while achieving industry-leading throughput and yield rates
CBATCH 300s Batch Thermal ALD
CBATCH 300s enables fully automated, high-throughput continuous production, significantly improving throughput and reducing COO (cost of ownership). The system delivers atomic-level precision control, producing pinhole-free, high-quality thin films suitable for high-κ dielectric layers, metal gate deposition, encapsulation coatings, electroplating seed layers, which are widely used in Mini/Micro LED, third-generation semiconductors, and integrated circuit manufacturing.
CBATCH 100s Batch Thermal ALD
CBATCH 100s is an atomic layer deposition (ALD) system designed for 4/6-inch LED production lines and oxide layer encapsulation coating on micro/nano-devices fabricated on patterned and planar sapphire substrates.
