PBATCH Batch PEALD
Product Overview
PBATCH realises low temperature, high quality plasma-enhanced ALD processes for high-quality thin film deposition (e.g., SiO?, Al?O?, TiO?) on various substrates, including glass, organic materials, polymers, metals, and ceramics. This system delivers exceptional coating uniformity, repeatability, and reliability while achieving industry-leading throughput and yield rates
Technical Advantages
Sample Size: Up to 12 inch
Fully automated, multi-wafer, high-volume production
Deposits optical films with visible reflectance R<0.05%
Batch-to-batch film thickness non-uniformity of Ru <1%
Industry-leading coating uniformity, repeatability, and reliability
Enables conformal deposition on entire lens surfaces and 3D micro/nano structures
The system enables in-situ plasma cleaning and alternating deposition of multiple thin-film combinations (e.g., SiO?/Al?O?/TiO?) within a single process chamber.
