KG Powder ALD for Mass Production
Product Overview
The KG series powder ALD is primarily used for high-precision thin-film deposition of various powder materials. This system can deposit coating films ranging from atomic layer to nanoscale thickness on micron-sized powder surfaces, featuring ultra-high sensitivity, uniformity and repeatability.
Technical Advantages
Uniformity < 3%
Maximum sample capacity: 100kg
Vertical dispersion, optimized gas flow
Patented rotary vacuum seal maintains stability
Sample reaction temperature range: RT-300°C
Maximum precursor heating temperature: RT-200°C
Multi-valve system guarantees optimal precursor delivery
Precursors: Supports up to 2 reactive gases and 5 liquid/solid precursor sources
