QBT-P
Dual-chamber Ultra-high Vacuum Magnetron Sputtering System
QBT-MP·L3
Multi-chamber Ultra-high Vacuum Magnetron Sputtering System
CBATCH 100s Batch Thermal ALD
GM R&D Powder ALD
PVD-100
Dual-chamber High Vacuum Magnetron Sputtering System
QBT-P L3
Triple-chamber Ultra-high Vacuum Magnetron Sputtering System(α-Ta、Nb-Ta)
QBT-MPV
Multi-target Ultra-high Vacuum Magnetron Vertical Sputtering System
QBT-MPC
Multi-target Ultra-high Vacuum Magnetron Co-Sputtering System
QBT-I
Dual-chamber High-speed Evaporator
KG Powder ALD for Mass Production
SCA Powder CVD for Mass Production
QBT-A
High Vacuum Plasma-enhanced ALD System
QBT-J
Four-chamber Ultra-high Vacuum GLAD System
QBT-E
Dual-chamber Ultra-high Vacuum Electron Beam Evaporator
PBATCH Batch PEALD
SICE-Y8 SiC Epitaxy CVD System
QBT-T
Dual-chamber Plasma-enhanced Wafer and Powder ALD System
MINI R&D Desktop ALD
CBATCH 300s Batch Thermal ALD
MPCVD Diamond CVD
Product Overview
Technical Advantages
