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QBT-T Dual-chamber Plasma-enhanced Wafer and Powder ALD System

Yunmao Product Overview

QBT-T is designed for micro/nano fabrication, powder or electrode sheet coating.

Yunmao Technical Advantages

Wafer Heating: RT-300±1oC

Uniformity: <3% (Al2O3) Powder, <1% (Al2O3) Electrode Sheet

Max Precursor: Max 3 Gas and 8 Liquid/Solid Precursors

Chamber: Dual-chamber design (1 powder ALD chamber + 1 electrode PEALD chamber) featuring independent control per chamber and doubled throughput.

Plasma: Max 3kW RF Auto-matching Power Source

Max Sample Size: Ф150mm (Customizable）Electrode Sheet or 100g Powder

Ozone Generator: Optional Configuration, Production Efficiency: 15 g/h

HMI: Fully Automated Human-Machine Interface

Products category

For Industry

ALD

Plasma Batch ALD

PBATCH Batch PEALD

Thermal Batch ALD

CBATCH 100s Batch Thermal ALD CBATCH 300s Batch Thermal ALD

CVD

MPCVD Diamond CVD

Epitaxy

SICE-Y8 SiC Epitaxy CVD System

Powder ALD/CVD

KG Powder ALD for Mass Production

SCA Powder CVD for Mass Production

For R&D

ALD

Single Wafer ALD

QBT-A
High Vacuum Plasma-enhanced ALD System MINI R&D Desktop ALD

Sputter

Single-Cathode Vertical Sputtering

QBT-P
Dual-chamber Ultra-high Vacuum Magnetron Sputtering System PVD-100
Dual-chamber High Vacuum Magnetron Sputtering System QBT-P L3
Triple-chamber Ultra-high Vacuum Magnetron Sputtering System(α-Ta、Nb-Ta)

Multi-Cathode Vertical Sputtering

QBT-MPV
Multi-target Ultra-high Vacuum Magnetron Vertical Sputtering System

Multi-Cathode Co-Sputtering

QBT-MPC
Multi-target Ultra-high Vacuum Magnetron Co-Sputtering System

MP L Customized Series

QBT-MP·L3
Multi-chamber Ultra-high Vacuum Magnetron Sputtering System

Evaporator

QBT-I Dual-chamber High-speed Evaporator

QBT-J Four-chamber Ultra-high Vacuum GLAD System

QBT-E Dual-chamber Ultra-high Vacuum Electron Beam Evaporator

Powder ALD

GM R&D Powder ALD

QBT-T Dual-chamber Plasma-enhanced Wafer and Powder ALD System

Representative paper on scientific research applications

Constructing a High-Energy and Durable Single-Crystal NCM811 Cathode for All-Solid-State Batteries by a Surface Engineering Strategy

keywords：LiNi0.8Co0.1Mn0.1O2, high-nickel cathode, all-solid-state battery, atomic layer deposition, lithium niobium oxides

date：18 June,2025

Simultaneous Enhancement of Interfacial Stability and Kinetics of Single-Crystal LiNi0.6Mn0.2Co0.2O2 through Optimized Surface Coating and Doping

keywords：Simultaneous Enhancement of Interfacial Stability and Kinetics of Single-Crystal LiNi0.6Mn0.2Co0.2O2 through Optimized Surface Coating and Doping

date：25 November,2020

Related products

GM R&D Powder ALD

The GM system enables uniform and precisely controlled ALD or MLD on micro-nano powders, featuring patented powder containers, dynamic powder fluidization mechanisms, fully automated temperature control, ALD precursor cylinders, automatic temperature control valves, and industrial-grade safety systems.

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QBT-P Dual-chamber Ultra-high Vacuum Magnetron Sputtering System

QBT-MP·L3 Multi-chamber Ultra-high Vacuum Magnetron Sputtering System

CBATCH 100s Batch Thermal ALD

GM R&D Powder ALD

PVD-100 Dual-chamber High Vacuum Magnetron Sputtering System

QBT-P L3 Triple-chamber Ultra-high Vacuum Magnetron Sputtering System(α-Ta、Nb-Ta)

QBT-MPV Multi-target Ultra-high Vacuum Magnetron Vertical Sputtering System

QBT-MPC Multi-target Ultra-high Vacuum Magnetron Co-Sputtering System

QBT-I Dual-chamber High-speed Evaporator

KG Powder ALD for Mass Production

SCA Powder CVD for Mass Production

QBT-A High Vacuum Plasma-enhanced ALD System

QBT-J Four-chamber Ultra-high Vacuum GLAD System

QBT-E Dual-chamber Ultra-high Vacuum Electron Beam Evaporator

PBATCH Batch PEALD

SICE-Y8 SiC Epitaxy CVD System

QBT-T Dual-chamber Plasma-enhanced Wafer and Powder ALD System

MINI R&D Desktop ALD

CBATCH 300s Batch Thermal ALD

MPCVD Diamond CVD

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