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SCA Powder CVD for Mass Production

Yunmao Product Overview

SCA can customize fluidized bed equipment for silicon-carbon anode with loading capacity of 25-100kg porous carbon and output capacity of 50-200kg silicon–carbon.

Yunmao Technical Advantages

Loading capacity：25-100kg Porous Carbon (Customizable)

Batch output capacity：50-200kg Silicon–carbon

Internal chamber temperature：RT-850℃

Gas inlet available：SiH4, C2H2, N2, NH3, H2O, CO2, etc.

Time (Deposit Si+Coat C)：12-15hrs

Discharge temperature：300-400℃

Uniformity：<3%

HMI：Full-automatic Human Machine Operation Interface

Safety：Industry Safety Interlock, Alarm, EMO

Products category

For Industry

ALD

Plasma Batch ALD

PBATCH Batch PEALD

Thermal Batch ALD

CBATCH 100s Batch Thermal ALD CBATCH 300s Batch Thermal ALD

CVD

MPCVD Diamond CVD

Epitaxy

SICE-Y8 SiC Epitaxy CVD System

Powder ALD/CVD

KG Powder ALD for Mass Production

SCA Powder CVD for Mass Production

For R&D

ALD

Single Wafer ALD

QBT-A
High Vacuum Plasma-enhanced ALD System MINI R&D Desktop ALD

Sputter

Single-Cathode Vertical Sputtering

QBT-P
Dual-chamber Ultra-high Vacuum Magnetron Sputtering System PVD-100
Dual-chamber High Vacuum Magnetron Sputtering System QBT-P L3
Triple-chamber Ultra-high Vacuum Magnetron Sputtering System(α-Ta、Nb-Ta)

Multi-Cathode Vertical Sputtering

QBT-MPV
Multi-target Ultra-high Vacuum Magnetron Vertical Sputtering System

Multi-Cathode Co-Sputtering

QBT-MPC
Multi-target Ultra-high Vacuum Magnetron Co-Sputtering System

MP L Customized Series

QBT-MP·L3
Multi-chamber Ultra-high Vacuum Magnetron Sputtering System

Evaporator

QBT-I Dual-chamber High-speed Evaporator

QBT-J Four-chamber Ultra-high Vacuum GLAD System

QBT-E Dual-chamber Ultra-high Vacuum Electron Beam Evaporator

Powder ALD

GM R&D Powder ALD

QBT-T Dual-chamber Plasma-enhanced Wafer and Powder ALD System

Application

Silicon-carbon anode materials

FAQ

How does SCA perform in terms of temperature uniformity?

The multi-zone temperature control design optimizes thermal uniformity, with zone temperature accuracy within ±1°C.

How does SCA perform in terms of uniformity of silicon-carbon anode production?

Optimized distributor plate design effectively reduces bubble size, enhances gas-solid reaction efficiency, and ensures uniform silicon-carbon deposition.

How does SCA perform in terms of operation safety?

The equipment design complies with semiconductor-grade standards and explosion-proof specifications. With a high level of automation, it ensures maximum operational safety.

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KG Powder ALD for Mass Production

The KG series powder ALD is primarily used for high-precision thin-film deposition of various powder materials. This system can deposit coating films ranging from atomic layer to nanoscale thickness on micron-sized powder surfaces, featuring ultra-high sensitivity, uniformity and repeatability.

GM R&D Powder ALD

The GM system enables uniform and precisely controlled ALD or MLD on micro-nano powders, featuring patented powder containers, dynamic powder fluidization mechanisms, fully automated temperature control, ALD precursor cylinders, automatic temperature control valves, and industrial-grade safety systems.

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QBT-P Dual-chamber Ultra-high Vacuum Magnetron Sputtering System

QBT-MP·L3 Multi-chamber Ultra-high Vacuum Magnetron Sputtering System

CBATCH 100s Batch Thermal ALD

GM R&D Powder ALD

PVD-100 Dual-chamber High Vacuum Magnetron Sputtering System

QBT-P L3 Triple-chamber Ultra-high Vacuum Magnetron Sputtering System(α-Ta、Nb-Ta)

QBT-MPV Multi-target Ultra-high Vacuum Magnetron Vertical Sputtering System

QBT-MPC Multi-target Ultra-high Vacuum Magnetron Co-Sputtering System

QBT-I Dual-chamber High-speed Evaporator

KG Powder ALD for Mass Production

SCA Powder CVD for Mass Production

QBT-A High Vacuum Plasma-enhanced ALD System

QBT-J Four-chamber Ultra-high Vacuum GLAD System

QBT-E Dual-chamber Ultra-high Vacuum Electron Beam Evaporator

PBATCH Batch PEALD

SICE-Y8 SiC Epitaxy CVD System

QBT-T Dual-chamber Plasma-enhanced Wafer and Powder ALD System

MINI R&D Desktop ALD

CBATCH 300s Batch Thermal ALD

MPCVD Diamond CVD

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